Ukwelashwa kokushisa ngamakhemikhali kuyinqubo yokwelapha ukushisa lapho i-workpiece ifakwa endaweni ethile yokushisa nokugcina ukushisa, ukuze ama-athomu asebenzayo aphakathi nendawo angene ongqimbeni olungaphezulu lwe-workpiece, ngaleyo ndlela aguqule ukwakheka kwamakhemikhali nokwakheka kwe ungqimba olungaphezulu lwe-workpiece, bese lushintsha ukusebenza kwalo. Ukwelashwa kokushisa kwamakhemikhali nakho kungenye yezindlela zokuthola ukuqina kwendawo, eqinile kanye ne-lining. Uma kuqhathaniswa nokucisha indawo, ukwelashwa kokushisa kwamakhemikhali akushintshi nje kuphela isakhiwo sensimbi, kodwa futhi kushintsha ukwakheka kwamakhemikhali. Ngokusho kwezakhi ezihlukene ezingenisiwe, ukwelashwa kokushisa kwamakhemikhali kungahlukaniswa ku-carburizing, nitriding, infiltration eminingi, ukungena kwezinye izakhi, njll. Inqubo yokwelapha ukushisa kwamakhemikhali ihlanganisa izinqubo ezintathu eziyisisekelo: ukubola, ukumuncwa, nokusabalalisa.

Ukwelashwa kokushisa kwamakhemikhali okuvame ukusetshenziswa:

I-Carburizing, i-nitriding (evame ukubizwa ngokuthi i-nitriding), i-carbonitriding (eyaziwa kakhulu ngokuthi i-cyanidation ne-nitriding ethambile), njll. I-sulfurizing, i-boronizing, i-aluminizing, i-vanadizing, i-chromizing, njll.

Ukwembathisa insimbi eyodwa noma ngaphezulu phezu kwezinto eziyisisekelo kungathuthukisa kakhulu ukumelana kwayo nokugqoka, ukumelana nokugqwala nokumelana nokushisa, noma ukuthola ezinye izakhiwo ezikhethekile. Kukhona i-electroplating, i-chemical plating, i-composite plating, i-infiltration plating, i-hot dip plating, i-vacuum evaporation, i-spray plating, i-ion plating, i-sputtering nezinye izindlela.

I-Metal Carbide Coating - I-Vapor Deposition

Ubuchwepheshe be-vapor deposition bubhekisela ohlotsheni olusha lobuchwepheshe bokumboza obufaka izinto zesigaba somhwamuko eziqukethe izakhi zokubeka phezu kwezinto ezibonakalayo noma zamakhemikhali ukuze zenze amafilimu amancane.

Ngokomgomo wenqubo yokubeka, ubuchwepheshe bokubeka umhwamuko bungahlukaniswa ngezigaba ezimbili: i-physical vapor deposition (PVD) kanye ne-chemical vapor deposition (CVD).

I-Physical vapor deposition ibhekisela kubuchwepheshe lapho into ikhishwa khona ibe ama-athomu, ama-athomu noma i-ioni ibe ama-ion ngezindlela ezibonakalayo ngaphansi kwezimo ze-vacuum, futhi ifilimu elizacile lifakwa ebusweni bento ngenqubo yesigaba segesi.

Ubuchwepheshe bokufaka izinto ezibonakalayo ngokuyinhloko buhlanganisa izindlela ezintathu eziyisisekelo: ukuhwamuka kwe-vacuum, i-sputtering, ne-ion plating.

Ukufakwa komhwamuko obonakalayo kunezinhlobonhlobo zezinto ezisetshenziswayo ze-substrate nezinto zefilimu; inqubo ilula, yonga izinto ezibonakalayo, futhi ayingcolisi; ifilimu etholiwe inezinzuzo zokunamathela okuqinile kusisekelo sefilimu, ukushuba kwefilimu efanayo, ukubumbana, namaphinikhodi ambalwa.

Ukufakwa komhwamuko wamakhemikhali kubhekisela endleleni lapho igesi exubile ihlangana nengaphezulu lengxenye engaphansi ezingeni lokushisa elithile ukuze yakhe ifilimu yensimbi noma ehlanganisiwe ebusweni be-substrate.

Ngenxa yokuthi ifilimu yokubeka umhwamuko wamakhemikhali inokumelana nokugqokwa okuhle, ukumelana nokugqwala, ukumelana nokushisa kanye nogesi, optical nezinye izinto ezikhethekile, iye yasetshenziswa kabanzi ekwakhiweni kwemishini, i-aerospace, ezokuthutha, imboni yamakhemikhali amalahle neminye imikhakha yezimboni.