lapaʻau wela ili kino
ʻO ka hoʻomaʻamaʻa wela kemika kahi kaʻina hana wela kahi e kau ʻia ai ka mea hana i loko o kahi ʻano kikoʻī no ka hoʻomehana ʻana a me ka mālama ʻana i ka wela, no laila e komo nā mana ikaika i loko o ka ʻili o ka mea hana, a laila e hoʻololi i ka haku mele a me ke ʻano o ka mea hana. papa ili o ka mea hana, a laila hoʻololi i kāna hana. ʻO ka hoʻomaʻamaʻa wela kemika kekahi o nā ala e loaʻa ai ka paʻakikī o ka ʻili, ka paʻakikī a me ka lining. Ke hoʻohālikelike ʻia me ka hoʻopau ʻana i ka ʻili, ʻaʻole hoʻololi wale ka lāʻau wela kemika i ke ʻano o ka ʻili o ke kila, akā hoʻololi pū nō hoʻi i kona haku mele. E like me nā mea like ʻole i hoʻokomo ʻia, hiki ke hoʻokaʻawale ʻia ka mālama wela kemika i ka carburizing, nitriding, multi-infiltration, infiltration o nā mea ʻē aʻe, a me nā mea ʻē aʻe.
Lapaʻau wela kemika maʻamau:
Carburizing, nitriding (ʻike nui ʻia ʻo nitriding), carbonitriding (ʻike pinepine ʻia ʻo cyanidation a me ka nitriding palupalu), etc. Sulfurizing, boronizing, aluminizing, vanadizing, chromizing, etc.
uhi metala
ʻO ka uhi ʻana i hoʻokahi a ʻoi aʻe paha nā mea metala ma luna o ka ʻili o ka mea kumu hiki ke hoʻomaikaʻi maikaʻi i kona pale ʻana i ka ʻaʻahu, ke kūpaʻa ʻino a me ke kūpaʻa wela, a i ʻole e loaʻa nā waiwai kūikawā ʻē aʻe. Aia nā electroplating, kemika plating, composite plating, infiltration plating, hot dip plating, vacuum evaporation, spray plating, ion plating, sputtering a me nā ʻano hana ʻē aʻe.
ʻAi ʻAi ʻAi Metala - Hoʻomoe ʻana i ka mahu
ʻO ka ʻenehana hoʻoheheʻe mahu e pili ana i kahi ʻano ʻenehana uhi hou e waiho ai i nā mea mahu-phase i loaʻa nā mea hoʻoheheʻe ma ka ʻili o nā mea ma ke ʻano kino a i ʻole kemika e hana i nā kiʻiʻoniʻoni lahilahi.
E like me ke kumu o ke kaʻina hana deposition, hiki ke hoʻokaʻawale ʻia ka ʻenehana deposition vapor i ʻelua mau ʻāpana: physical vapor deposition (PVD) a me chemical vapor deposition (CVD).
Hoʻopaʻa mahu kino (PVD)
ʻO ka hoʻoheheʻe ʻana o ka mahu kino e pili ana i kahi ʻenehana kahi e hoʻoheheʻe ʻia ai kekahi mea i loko o nā ʻātoma, nā molekala a i ʻole ka ionized i loko o nā ion ma nā ʻano kino ma lalo o nā kūlana ʻawaʻawa, a waiho ʻia kahi kiʻiʻoniʻoni lahilahi ma ka ʻili o ka mea ma o ke kaʻina hana kinoea.
Hoʻokomo ʻia ka ʻenehana deposition kino i ʻekolu mau ʻano kumu: ka hoʻoheheʻe ʻana i ke kino, ka sputtering, a me ka hoʻoheheʻe ion.
Loaʻa i ka waiho ʻana o ka mahu kino ka laulā o nā mea substrate kūpono a me nā mea kiʻiʻoniʻoni; He maʻalahi ke kaʻina hana, mālama waiwai, a me ka haumia ʻole; ʻO ka kiʻiʻoniʻoni i loaʻa nā mea maikaʻi o ka hoʻopili ikaika ʻana i ke kumu kiʻiʻoniʻoni, ka mānoanoa kiʻi like ʻole, compactness, a me nā pinholes liʻiliʻi.
Hoʻopaʻa ʻia i ka mahu (CVD)
ʻO ka hoʻomoe ʻana i ka mahu kemika e pili ana i ke ʻano o ka hui ʻana o ke kinoea hui pū me ka ʻili o kahi pani ma kahi mahana e hana ai i mea metala a i ʻole ke kiʻi ʻoniʻoni ma ka ʻili o ka substrate.
No ka mea, ʻoi aku ka maikaʻi o ka hoʻopaʻa ʻia ʻana o ke kiʻiʻoniʻoni vapor deposition, corrosion resistance, heat resistance a me ka uila, optical a me nā mea kūikawā ʻē aʻe, ua hoʻohana nui ʻia i ka hana mīkini, aerospace, ka lawe ʻana, ka ʻoihana kemika a me nā ʻoihana ʻē aʻe.
